{1322} revision 0 modified: 07-22-2015 18:01 gmt

PMID-25571176 Fabrication and characterization of a high-resolution neural probe for stereoelectroencephalography and single neuron recording.

  • Layer stack:
    • 5um PI (UBE U-varnish S)
    • 50nm SiC
      • Deposited at 100C.
    • 300nm Pt
    • 30nm SiC
    • 10nm DLC
    • 5um PI
      • Cured at 450C
    • 100nm Al hard mask (removed)
    • Cytop dry adhesion layer
      • softbake to remove solvent,
      • then hardbake at 290C for 4 hours to anneal the PI and adhere the Cytop to it.